Fujia Gallium

Founded in 2019 and based in Hangzhou, China, Fujia Gallium focuses on gallium oxide substrates and epitaxial films for high-performance applications in the semiconductor industry. In September 2025, Fujia Gallium closed series A+ funding from new investor Shenzhen Capital Real Estate Fund, returning investors China Internet Investment Fund, Hangzhou Shengde, R-Z Capital and Zhongying Holding with participation from other unspecified investors. Fujia Gallium specializes in the research and development of wide-bandgap semiconductor materials, particularly gallium oxide substrates and epitaxial films. Their core product offerings include various sizes of gallium oxide substrates, such as 2-inch and 4-inch wafers, and high-quality epitaxial films with thicknesses exceeding 10 microns.

These products are designed for high-performance semiconductor devices in sectors like electric vehicles, smart grid systems, and advanced electronics. The company generates revenue through the sale of gallium oxide substrates and epitaxial films and other related products. The funding raised in September 2025 will primarily be used to build China's first 6-inch gallium oxide single crystal and epitaxial wafer production line, with an expected annual production capacity of 10,000 wafers by the end of 2026. This funding round will also be used to improve the efficiency of gallium oxide single crystal preparation, optimize epitaxial quality, and verify devices, laying a solid foundation for subsequent product iterations and technology upgrades.